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A 4 × 4 Butler matrix optimized for umts applications
Theodores N. Kalfas
, John N. Sahalos
Department of Engineering
Aristotle University of Thessaloniki
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Keyphrases
Butler Matrix
100%
Umts
100%
Double Layer
33%
Special Care
33%
Elliptic Coupler
33%
High Permittivity Substrate
33%
UMTS Band
33%
High-temperature Superconductors
33%
Substrate Temperature
33%
Conventional Photolithography
33%
Engineering
Double Layer
100%
Substrate Temperature
100%
Optical Lithography
100%
Superconductor
100%
Material Science
Permittivity
100%
High Temperature Superconductors
100%
Multilayer
100%