Photothermal radiometric and spectroscopic measurements on silicon nitride thin films

M. Nestoros, A. Gutierrez-Llorente, A. Othonos, C. Christofides, J. M. Martinez-Duart

Research output: Contribution to journalArticlepeer-review

Abstract

Thin films of silicon nitride of various thicknesses, deposited by radio frequency magnetron sputtering on silicon quartz substrate, have been characterized by laser-induced and frequency scanned photothermal radiometry. Fourier transform infrared spectroscopy was also used to provide a qualitative description of the behavior of the films in the infrared range which shows favourable properties of these coatings to be used in passive cooling applications.

Original languageEnglish
Pages (from-to)6215-6219
Number of pages5
JournalJournal of Applied Physics
Volume82
Issue number12
Publication statusPublished - 15 Dec 1997

Fingerprint

Dive into the research topics of 'Photothermal radiometric and spectroscopic measurements on silicon nitride thin films'. Together they form a unique fingerprint.

Cite this