Thin films of silicon nitride of various thicknesses, deposited by radio frequency magnetron sputtering on silicon quartz substrate, have been characterized by laser-induced and frequency scanned photothermal radiometry. Fourier transform infrared spectroscopy was also used to provide a qualitative description of the behavior of the films in the infrared range which shows favourable properties of these coatings to be used in passive cooling applications.
|Number of pages||5|
|Journal||Journal of Applied Physics|
|Publication status||Published - 15 Dec 1997|