Abstract
Thin films of silicon nitride of various thicknesses, deposited by radio frequency magnetron sputtering on silicon quartz substrate, have been characterized by laser-induced and frequency scanned photothermal radiometry. Fourier transform infrared spectroscopy was also used to provide a qualitative description of the behavior of the films in the infrared range which shows favourable properties of these coatings to be used in passive cooling applications.
| Original language | English |
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| Pages (from-to) | 6215-6219 |
| Number of pages | 5 |
| Journal | Journal of Applied Physics |
| Volume | 82 |
| Issue number | 12 |
| Publication status | Published - 15 Dec 1997 |